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(Click for frequent words.) 72 nanoimprint 71 nano imprint 70 nano imprint lithography 69 EUV lithography 67 e beam lithography 66 photolithography 66 Molecular Imprints 66 UV NIL 65 nanoimprint lithography 65 lithography 65 EUVL 65 computational lithography 65 photolithographic 65 nanoimprint lithography NIL 65 nanopatterning 65 EUV mask 65 nanolithography 64 maskless lithography 64 nano patterning 64 micro machining 64 silicon MEMS 64 nanoimprinting 64 Photolithography 63 microfabrication techniques 63 SOI CMOS 63 optical lithography 63 immersion lithography 63 polishing pads 63 photopolymer 63 x ray optics 62 carbon nanotubes CNT 62 extreme ultraviolet lithography 62 mask aligners 62 micromechanics 62 high-k/metal gate 62 defectivity 62 metallization 62 Rapid prototyping 62 Silicon Germanium 62 CMOS fabrication 62 micro optics 62 wafer bonder 62 dielectric etch 62 SWCNT 62 SiON 62 MEMS resonators 61 scanning electron microscope SEM 61 PZT 61 planarization 61 Nova NanoSEM 61 cytometry 61 ownership CoO 61 metallisation 61 nm CMOS 61 QMEMS 61 microfabrication 61 flexo printing 61 bipolar transistors 61 indium tin oxide ITO 61 transparent conductive 61 spectroscopic methods 61 UV LED 61 wirebond 61 wafer bumping 60 nm CMOS process 60 BEOL 60 #nm immersion lithography 60 epitaxy HVPE 60 Grätzel cells 60 X ray microscopy 60 UNCD 60 SiGe bipolar 60 #nm immersion 60 photoresist 60 wafer thinning 60 electrodeposition 60 monodisperse 60 #nm DRAM 60 nanoarrays 60 optical waveguides 60 sub micron 60 #.# micron CMOS 60 micromachining 60 vapor deposition 60 hydride vapor phase 60 photomasks 60 dielectric materials 60 deep submicron CMOS 60 laser annealing 60 Lithography 60 Imprio 60 photoresists 60 low k dielectrics 60 nonlinear optical 60 photodetectors 60 oxide semiconductor 60 APTIV film 60 nanometric 60 WLCSP 60 wafer dicing 60 CMOS oscillators 60 CMOS transistors 60 wafer bonding 59 HEMTs 59 mask aligner 59 silicon substrates 59 solder bump 59 EUV resists 59 overlay metrology 59 CMOS logic 59 aluminum nitride 59 #.#um [001] 59 Double Patterning 59 Nanoimprint lithography 59 photonic devices 59 maskless 59 reticle inspection 59 pulsed laser deposition 59 FinFETs 59 through silicon vias 59 nm immersion 59 copper metallization 59 nanofabrication techniques 59 silicon nitride 59 MALDI 59 nanocomposite material 59 sputter deposition 59 extreme ultra violet 59 Scanning Probe Microscopes 59 nanofilm 59 #nm lithography [001] 59 GaN HEMTs 59 lithographic processes 59 surface functionalization 59 indium gallium arsenide 59 backside illumination 59 EVG# 59 Gallium Arsenide 59 sapphire substrate 59 monolithic microwave integrated 59 transparent electrode 59 photonic crystal 59 micromechanical 59 micromachined 59 Flip Chip 59 #nm/#nm 59 CMOS wafer 59 scanning microscopy 59 nanoparticle inks 59 Carbon nanotube 59 VUV 59 furnaceware 59 nanomechanical 59 piezo ceramic 59 carbon nanotube CNT 59 CdSe 59 micromirror 59 solder reflow 59 antireflective coatings 59 Si substrate 59 lithography simulation 59 inkjet printing 59 Microfluidic 59 ultrafast laser 59 ZnS 59 FinFET 59 nanoelectronic 59 DongbuAnam 59 conductive inks 59 ultraviolet curable 59 MOS transistors 59 k dielectrics 59 plasma etching 59 Flex OneNAND 59 submicron 59 barium ferrite 59 deep submicron 59 tunable filters 58 DFEB 58 MALDI-TOF/TOF 58 sol gel 58 photoluminescence 58 Indium Phosphide 58 embedded nonvolatile memory 58 photomask 58 nanocrystal 58 indium phosphide InP 58 solder bumping 58 microchannel plate 58 Photomask 58 Vor ink 58 flexible substrates 58 inkjet inks 58 manganite 58 Esatto Technology 58 ActiPix 58 SiC substrates 58 solder paste 58 pellicle 58 NuFlare 58 solder bumps 58 Aera2 58 singulation 58 metallic inks 58 intermetallic 58 coating thickness 58 lithographic 58 stereolithography 58 UVTP 58 AFM probes 58 TOF TOF 58 photonic bandgap 58 nitride semiconductor 58 monolithically integrated 58 phototransistors 58 k gate dielectric 58 high voltage BCDMOS 58 darkfield 58 millisecond annealing 58 electron optics 58 Semiconducting 58 silicon Mach Zehnder 58 nanosilicon 58 CIGS cells 58 nanowire transistors 58 carbon nanotube transistors 58 #nm CMOS [002] 58 aspheric 58 porous silicon 58 InGaN 58 advanced leadframe 58 deep sub micron 58 EBDW 58 XT #i 58 underfill 58 electron beam lithography 58 OptiChem 58 EUV Lithography 58 nanopositioning 58 nonpolar GaN 58 metallic nanoparticles 58 VCSELs 58 RRAM 58 CNT FED 58 AlN 58 PROLITH 58 GaN HEMT 58 transmission electron microscopes 58 extendibility 58 MEMS 58 accuracy repeatability 58 nitride 58 PEEK OPTIMA 58 diffractive optical elements 58 photomask inspection 58 ArF immersion lithography 58 photodiode arrays 58 nm lithography 58 silica spheres 58 hafnium oxide 58 deep ultraviolet DUV 57 projected capacitive touch 57 foil resistor 57 eWLB technology 57 Actel Fusion 57 monochromator 57 nanomanipulation 57 silicon germanium SiGe 57 EUV 57 JENOPTIK GmbH 57 polyimide 57 Gallium Nitride 57 high-k/metal-gate 57 millimeter silicon wafers 57 gallium nitride 57 nano coatings 57 Solamet ® 57 microstructured 57 electron beam welding 57 FlexUPD 57 3Xnm 57 picosecond lasers 57 .# micron 57 deformable mirrors 57 nematic 57 epi wafers 57 e beam DFEB 57 superwide format 57 millisecond anneal 57 OSTAR ® 57 additive fabrication 57 substrates 57 nanocomposite materials 57 Alchimer 57 #um [002] 57 plasma etch 57 reflow soldering 57 k dielectric 57 Immersion Lithography 57 epiwafers 57 EUV masks 57 PolyJet Matrix TM 57 1μm 57 solder pastes 57 CMOS compatible 57 SIMOX 57 Czochralski 57 Micrometer 57 InAs 57 Dektak 57 microbolometers 57 CMOS silicon 57 vertical cavity 57 nanoantenna 57 spintronic 57 thermo mechanical 57 superlattice 57 thermomechanical 57 UV curable 57 #nm nodes 57 #.#um CMOS 57 brightfield 57 vibrational spectroscopy 57 indium gallium arsenide InGaAs 57 TSVs 57 conductive adhesives 57 microelectronic devices 57 Complementary Metal Oxide Semiconductor 57 Plasmonic 57 nanostructured silicon 57 hardcoat 57 5V CMOS 57 Raman spectroscopy 57 planar waveguide 57 silicon photonic 57 HfSiON 57 SOI substrates 57 k gate dielectrics 57 III nitride 57 Solido Variation Designer 57 optical metrology 57 conformal coatings 57 ferrite 57 laser sintering 57 ultrasonic welding 57 silicon nanowire 57 nanocomposite 57 optical microscopy 57 Strained silicon 57 #nm #nm [005] 57 polymer nanocomposites 57 package SiP 57 quantum cascade 57 reactive ion 57 linewidths 57 microcontact printing 57 CMOS imager 57 deep silicon etch 57 electroformed 57 UltraCMOS 57 QuickCap NX 57 titanium carbide 57 2Xnm 57 nanocrystalline 57 #nm node [001] 57 ITRS roadmap 57 scatterometry 57 microelectromechanical systems MEMS 57 #.#μm [002] 57 ChIP chip 57 DSSCs 57 LiNbO3 57 heterostructure 57 rheometer 57 threshold voltages 57 MEMS oscillator 57 lithographic techniques 57 microcapillary 57 absorption spectroscopy 57 MESFET 57 solution processable 56 polydimethylsiloxane PDMS 56 DPSS lasers 56 outcoupling 56 Fourier transform infrared 56 capillary electrophoresis 56 piezoresistive 56 TestKompress 56 #nm silicon 56 ellipsometry 56 GaN 56 conductive coating 56 stencil printing 56 Ball Grid Array 56 nm wavelengths 56 Superlattice 56 silicon germanium 56 silicon etch 56 SiGe C 56 Mask Aligner 56 CoO 56 pHEMT 56 polymeric materials 56 resin infusion 56 solderable 56 laser scribing 56 BCDMOS 56 X Ray Diffraction 56 selective emitter 56 injection moldable 56 patterning 56 SOI wafer 56 Gallium Arsenide GaAs 56 DRIE 56 laser micromachining 56 nanoporous 56 epitaxial graphene 56 nanotubes nanowires 56 ZnSe 56 defect densities 56 Tunable 56 nanometer silicon 56 MEMS microelectromechanical systems 56 zirconium oxide 56 DEV DA TOMAR NEXT 56 HVPE 56 silicon micromachining 56 dimensional metrology 56 Ascentis Express 56 Braggone 56 extreme ultraviolet EUV 56 MOS transistor 56 magnetron sputtering 56 copper interconnects 56 MOEMS 56 #.# micron node 56 gate dielectrics 56 nm nodes 56 passivation 56 gallium arsenide gallium nitride 56 Wafer Level Chip 56 CRIUS 56 coater developer 56 silicon Si 56 tunable RF 56 Agilent SurePrint 56 bismuth telluride 56 nanometer CMOS 56 barium titanate 56 CMOS 56 microreactors 56 pMOS 56 TDK EPC 56 UV lasers 56 SiliconSmart ACE 56 Patterning 56 Helios NanoLab 56 CBT resin 56 hardfacing 56 GaN transistor 56 dielectric layers 56 gallium nitride GaN 56 ReRAM 56 electroless 56 particle sizing 56 Metamaterial 56 #nm CMOS [001] 56 microcavity 56 transistor HEMT 56 Silicon CMOS Photonics 56 photopolymers 56 HRTEM 56 digital halftone 56 laser diffraction 56 engineered substrates 56 numerical aperture NA 56 scanning electron microscopes 56 WiCkeD 56 Encounter RTL Compiler 56 piezoelectric actuator 56 InSb 56 electrophoretic 56 layer deposition ALD 56 photodiode 56 correction OPC 56 ECPR 56 Picogiga delivers advanced 56 nanostructured surfaces 56 fused quartz 56 microelectromechanical system 56 nanoindentation 56 MALDI TOF 56 Mbit MRAM 56 optical coatings 56 dielectrics 56 polymer coatings 56 sub angstrom 56 photoresist stripping 56 wafer metrology 56 nanoelectronic devices 56 nanopatterns 56 CMOS MEMS 56 VISIONPAD 56 repeatability 56 DiCon 56 Nanoindentation 56 AlGaAs 56 IGBT Insulated Gate 56 nanodevice 56 silicon oxynitride SiON 56 nMOS 56 conductive plastics 56 ultrahigh resolution 56 #μm thick [002] 56 gate electrode 56 overmolding 56 inkjet printheads 56 Nanotube 56 electroluminescence 56 VCSEL 56 microfabricated 56 X ray absorption spectroscopy 56 Focused Ion Beam 56 athermal 56 Altera FPGAs 56 dephasing 56 FE SEM 56 inorganic nanocrystals 56 UV curable ink 56 physical vapor deposition 56 functionalization 56 PEDOT PSS 56 #nm RF CMOS 56 YAG lasers 56 Dip Pen Nanolithography ® 56 anneal 56 optically transparent 56 tunable filter 56 inkjet printhead 56 BiCMOS 56 NPFLEX 56 CIGS solar cell 56 electron mobility 56 epitaxial layer 56 evanescent wave 56 Nanoelectronic 56 flexographic plates 56 UV cured 56 electro optic polymers 56 Nanometer 56 chalcogenide 56 UniPixel 56 Wafer Level Packaging 55 QuantumFilm 55 conductive epoxy 55 conformal coating 55 Stratasys FDM 55 FT IR 55 BiFET 55 circuit MMIC 55 optical spectroscopy 55 deconvolution 55 UV curable coatings 55 nano particle 55 carbon nanomaterial 55 reticles 55 FDSOI 55 solder paste printing 55 micron 55 silica substrate 55 low k dielectric 55 AquiVia 55 TiN 55 mass spectrometry MS 55 transparent conductive coatings 55 conventional photolithography 55 nm node 55 piezoelectric ceramic 55 transparent conductive films 55 RF CMOS 55 SAXS 55 immersion litho 55 thermoplastic polyurethane TPU 55 SUSS MicroTec 55 UV curing inks 55 SPIE Photonics West 55 RF Microwave 55 hermetic packaging 55 Oxide Silicon 55 Perkinamine 55 nm DRAM 55 Aerosol Jet 55 TSMC #nm [001] 55 Micro Piezo 55 Silicon Nitride 55 dimensional nanostructures 55 microfluidics 55 Applied Baccini 55 Applied Endura 55 Opti Probe 55 vanadium dioxide 55 aCGH 55 Chemical Vapor Deposition CVD 55 fused silica 55 LTPS TFT 55 ultrasonics 55 SiO 2 55 BrightLase 55 Scanning Probe Microscopy 55 #nm wavelength [001] 55 XFP module 55 dual damascene 55 SiGen 55 solventless 55 ViPR 55 indium phosphide 55 Silicon Photonics 55 Simitri 55 multilayer ceramic capacitors MLCC 55 SEMATECH 55 nanophotonics 55 superlens 55 microfocus X ray 55 2μm 55 CIGS solar cells 55 etching DRIE 55 Clear Shape 55 microlenses 55 zinc selenide 55 nanostructured materials 55 ArF 55 Perpendicular Magnetic Recording PMR 55 UNCD Horizon 55 RFCMOS 55 squeegee blades 55 Silicon Carbide 55 ViSmart viscosity sensor 55 cryogenically cooled 55 SAW oscillators 55 DualBeam 55 Cree GaN 55 ceramic capacitor 55 nanoelectromechanical systems 55 backside metallization 55 Amorphous Silicon 55 tribological 55 AlSiC 55 Synopsys TCAD 55 pn junctions 55 UHPLC 55 #μm [001] 55 Thin Film Transistor 55 block copolymer 55 organic TFTs 55 induced fluorescence 55 Encounter Conformal Constraint Designer 55 PHEMT 55 spectral imaging 55 WL CSP 55 microdevices 55 silicon carbide SiC 55 semiconducting nanowires 55 nanofluidics 55 EMCCD 55 AFMs 55 line BEOL 55 nano engineered 55 MEMS resonator 55 Raman spectrometer 55 Spintronics 55 Peregrine UltraCMOS 55 silicon CMOS 55 eutectic 55 Impinj AEON 55 SMIC #.#um 55 reflectometry 55 OP# [003] 55 UV Visible 55 nanofluidic 55 Gas Chromatography 55 ZEISS 55 reflow solder 55 liquid crystalline 55 RFID inlay 55 AlInGaP 55 Silicon Oxide Nitride 55 Selective Laser Sintering SLS 55 fxP 55 nano crystalline 55 CMP slurries 55 GaAs MMIC 55 DFM DFY 55 conductive adhesive 55 capacitive sensing 55 confocal microscopy 55 femtosecond lasers 55 TGA# SL 55 #.#μ 55 eWLB 55 #nm laser [002] 55 leadframe 55 photonic crystal fibers 55 Next Generation Lithography 55 SWIR cameras 55 nanofabrication 55 silicon waveguide 55 FAIMS 55 electro optic modulator 55 EDXRF 55 3D TSV 55 Physical Vapor Deposition PVD 55 Stereolithography SLA 55 AQUANOX A# 55 OLED microdisplay 55 IR spectroscopy 55 laser diode modules 55 RF MEMS 55 QLP 55 #nm MLC 55 Dimatix 55 C4NP 55 conductive ink 55 MEMS oscillators 55 conductive coatings 55 crystalline semiconductors 55 photoresist strip 55 amorphous silicon Si 55 polyacrylonitrile 55 productive nanosystems 55 FEOL 55 nanotube arrays 55 chipless RFID 55 microtechnologies 55 CMOS ICs 55 #nm laser [001] 55 photoacoustic imaging 55 processless 55 FusionQuad 55 laser interferometer 55 solder mask 55 nanometer scale 55 InN 55 focused ion beam 55 Nitride 55 substrate 55 SWNT 55 JESD# [002] 55 TMOS display 55 boron nitride 55 silicon 55 Photoresist 55 QCLs 54 programmable SoC 54 IQ Aligner 54 subwavelength 54 FineSim SPICE 54 Gallium Nitride GaN 54 planar lightwave circuits 54 ZINK Paper 54 graphene circuitry 54 AlGaInP 54 5μm 54 transistor arrays 54 BioScope II 54 thermoform 54 excimer lasers 54 femtosecond laser pulses 54 #/#nm 54 plasmon 54 extruded profiles 54 CMOS processes 54 EUV resist 54 MB#K# 54 eG ViaCoat 54 Ultem 54 parasitic extraction 54 SOI Silicon 54 Z Foil 54 nano fabrication 54 nanostructuring 54 microscale 54 Structured ASICs 54 eutectic solder 54 ATRP 54 Optical Profiler 54 dye sublimation 54 Strained Silicon 54 hyperlens 54 Nanonex 54 nanocoatings 54 microelectromechanical systems 54 photorefractive 54 voltage CMOS 54 ultrashort pulses 54 magnetoresistive random access 54 nano powders 54 antireflection 54 SiC wafers 54 electroluminescence EL 54 argon fluoride 54 PolyJet 54 nanostructure 54 crystalline Si 54 finFETs 54 multilayers 54 HAMR 54 Luminescent 54 thermal conduction 54 OneChip 54 Raman Spectroscopy 54 UV curing 54 BinOptics 54 QFN packages 54 nanometrology 54 fluorescence excitation 54 selective laser sintering 54 quantum cascade lasers 54 mesoscopic 54 quantum dot lasers 54 InGaAs 54 nanoparticle synthesis 54 liquid crystal polymer 54 terahertz imaging 54 photon detection 54 Chip Scale 54 macroporous 54 surface mountable 54 Calibre LFD 54 ion traps 54 Indium Phosphide InP 54 indium arsenide 54 nanofabricated 54 monolithic CMOS 54 thermally conductive 54 ULTEM 54 planar 54 ChemetriQ 54 Metrology System 54 Capillary Electrophoresis 54 PIN diodes 54 micromanipulation 54 antifuse 54 emission spectrometry 54 1Gbit DDR2 54 triplexer 54 LSA#A 54 HBLEDs 54 CMOS RF CMOS 54 #LP [002] 54 VECTOR Express 54 submicrometer 54 FIB SEM 54 bilayer graphene 54 amorphous silicon 54 nanowire arrays 54 Printhead 54 silicon nanocrystals 54 WS CRDS 54 fluorescence detection 54 Kodak Flexcel NX 54 SN#C 54 8bit MCUs 54 micro electromechanical 54 Si substrates 54 nanosized 54 indium gallium nitride 54 UMC #.#um 54 fluorescence spectroscopy 54 Spintronic 54 Fractional N 54 plasmonics 54 colorimetry 54 silanes 54 crystallinity 54 NanoScope 54 parametric testers 54 silicon foundries 54 TFTs 54 nanoscale 54 carbon nanotube arrays 54 etch deposition 54 carbon nanotube 54 semiconductive 54 scintillator 54 magnetostrictive 54 Absorption Spectroscopy 54 fluorescent probes 54 ultrasonic transducers 54 Microscopy AFM 54 LTQ Orbitrap 54 nanometer 54 MAX# integrates 54 DPN ® 54 oxide semiconductors 54 #.#μm [001] 54 effect transistors FETs 54 SMS NIL 54 HORIBA Jobin Yvon 54 semiconductor nanostructures 54 silicon carbide 54 SOI substrate 54 #nm NAND flash 54 FeRAM 54 biocompatible polymers 54 2G HTS wire 54 Polyimide 54 interferometry 54 Sanger sequencing 54 Photonic crystals 54 ASML lithography 54 subnanometer 54 indium gallium phosphide InGaP 54 rigid substrate 54 MALDI MS 54 scanning tunneling microscopy STM 54 nanoengineered 54 UV VIS 54 Fabry Perot 54 SMT LEDs 54 multiscale 54 lithographic patterning 54 composite laminates 54 nanophotonic 54 Vertical Cavity Surface Emitting 54 HEMT 54 nano coating 54 UV inkjet 54 colorimetric 54 nickel silicide 54 MEMs 54 functionalizing 54 DS DBR 54 #nm SOI 54 SiC 54 temporary wafer bonding 54 nm SOI 54 microfluidic chip 54 GaN nanowires 54 FD SOI 54 Miyachi Unitek 54 carbon nanotubes graphene 54 microspectroscopy 54 nanobelts 54 Zetasizer 54 epiwafer 54 MTS# 54 crystal resonator 54 SPIE Advanced Lithography 54 Smart Stacking 54 capacitive touch sensor 54 Langmuir Blodgett 54 electrochemical deposition 54 epitaxial deposition 54 spectrophotometric 54 EMI Filters 54 lithium niobate 54 aspheres 54 Parylene 54 microcavities 54 nanometer node 54 Scanning Electron Microscope SEM 54 surface plasmon resonance 54 UV2A 54 #nm NAND Flash 54 HV CMOS 54 solvent evaporation 54 electro optic polymer 54 SD# Pro 54 nanotube transistors 54 CVD diamond 54 Electron beam 54 PVD coating 54 F3D 54 MEMS fabrication 54 STT RAM 54 CMOS circuits 54 spectroscopy 54 cell culturing 54 Quantum Dot 54 carbon nanotubes CNTs 54 cermet 54 aspheric lenses 54 nanoribbons 54 interposers 54 1T FLASH 54 bicomponent 54 uniaxial strain 54 nanomechanical devices 54 MunEDA WiCkeD 54 ferroelectric random access 54 deformable mirror 54 Wafer Level 54 GxT 54 interposer 54 GaN epitaxial 54 LED printheads 54 numerical aperture 54 nm SRAM 54 CMP consumables