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(Click for frequent words.) 66 e beam lithography 66 nano imprint 65 EUV lithography 65 computational lithography 64 imprint lithography 64 EUVL 63 e beam DFEB 63 EBDW 63 extreme ultraviolet lithography 62 NuFlare 62 planar CMOS 62 nanoimprint 62 EUV mask 62 MAPPER 62 optical lithography 61 nanoimprint lithography 61 lithography simulation 61 CMOS fabrication 61 nano patterning 61 nm CMOS 61 photolithographic 61 micro machining 61 nanoimprinting 61 nano imprint lithography 61 nanoimprint lithography NIL 60 nanopatterning 60 Silicon Germanium 60 nm CMOS process 60 indium gallium arsenide InGaAs 60 photomask inspection 60 micro electromechanical 60 nanometrology 60 nanofilm 60 EUV resists 60 wafer bonder 60 bioimaging 60 extreme ultraviolet EUV 60 nanoelectronic 60 QWIP 60 nm SOI 59 shearography 59 photonic devices 59 CNT FED 59 Rapid prototyping 59 Silicon CMOS Photonics 59 #nm fab 59 laser micromachining 59 lithography 59 nm DRAM 59 monolithically integrated 59 nanophotonic 59 X ray microscopy 59 3Xnm 59 ITRS roadmap 59 DFEB 59 OLED microdisplay 59 CMOS photonics 59 nm lithography 59 CMOS compatible 59 Nova NanoSEM 59 overlay metrology 59 nm immersion 59 #nm immersion 59 oxide semiconductor 59 nanoelectronic devices 59 correlative microscopy 59 microelectronic components 59 SEMATECH FEP 58 GenISys 58 nanolithography 58 ArF immersion lithography 58 nanoscale characterization 58 #nm CMOS [001] 58 inkjet printhead 58 high-k/metal-gate 58 #nm photomask 58 maskless 58 lensless imaging 58 electron beam lithography 58 deep submicron CMOS 58 Gallium Nitride 58 immersion lithography 58 #nm silicon 58 programmable SoC 58 holistic lithography 58 III nitride 58 monolithic microwave integrated 58 collimating 58 SD# Pro 58 Laurent Malier CEO 58 #nm SOI 58 QuantumFilm 58 PicoP display 58 CIGSe 58 deep silicon etch 58 EUV 58 #nm DRAM 58 silicon photonic 58 2Xnm 58 #nm SoC 58 silicon germanium SiGe 58 #nm immersion lithography 58 FE SEM 58 Imec performs world 58 terahertz imaging 58 dielectric etch 58 deep sub micron 58 Structured eASIC 57 RRAM 57 nanopositioning 57 nanometer silicon 57 Vistec Electron Beam 57 silicon photonics 57 transparent conductive coatings 57 DSSCs 57 rollable display 57 protein biochip 57 Spintronics 57 quantum cascade lasers 57 SWIR cameras 57 optical waveguides 57 electron optics 57 micromirror 57 carbon nanotube CNT 57 photolithography 57 deep submicron 57 Aixtron MOCVD 57 Mach Zehnder modulator 57 quantum dot lasers 57 k gate dielectrics 57 x ray optics 57 nanometer lithography 57 PolyJet Matrix TM 57 reticle inspection 57 #mm MEMS 57 OneChip 57 UV NIL 57 IMEC Leuven Belgium 57 microbolometer 57 optical metrology 57 DFM DFY 57 microdevices 57 opto mechanical 57 nitride semiconductor 57 EUV masks 57 microfabrication 57 MEMS oscillators 57 nm nodes 57 MEMS fabrication 57 epi wafers 57 extreme ultra violet 57 hyperspectral imager 57 MOS transistors 57 CMOS wafer 57 nm NAND flash 56 high voltage BCDMOS 56 EDXRF 56 OSTAR ® 56 multijunction 56 ZEISS 56 3D Interconnect 56 k gate dielectric 56 MathStar FPOA 56 MEMS NEMS 56 design kits PDKs 56 k dielectrics 56 CMOS oscillators 56 Vertical Cavity Surface Emitting 56 Raman spectrometer 56 #nm #nm [005] 56 fluorescence spectroscopy 56 deformable mirrors 56 high-k/metal gate 56 epitaxial deposition 56 SOI CMOS 56 micromechanical 56 ion microscope 56 manufacturability DFM 56 nanotools 56 millimeter wave imaging 56 spectral imaging 56 CRIUS 56 plasmonic devices 56 nanomechanical 56 concentrating photovoltaics 56 CIGSolar ™ 56 TOF TOF 56 micromachined 56 antireflective coatings 56 PROLITH 56 Interferometric 56 Clear Shape 56 Eudyna 56 hermetic packaging 56 nanobattery 56 millimeter silicon wafers 56 nm geometries 56 SensL 56 micro optics 56 lithographic processes 56 cadmium zinc telluride 56 Scanning Probe Microscopy 56 Dektak 56 microelectromechanical systems MEMS 56 International Sematech 56 helium ion 56 backside illumination 56 #V LDMOS 56 #nm nodes 56 nanocircuits 56 optical interconnects 56 XT #i 56 Photolithography 56 HV CMOS 56 TFT LCD module 56 RFCMOS 56 Obducat 56 SiPs 56 carbon nanotube transistors 56 OptiStruct 56 #nm node [002] 56 epiwafers 56 monochromator 56 MEMS microelectromechanical systems 56 SMT placement 56 semiconductor lithography 56 Access Memory MRAM 56 BrightLase 56 microelectromechanical 56 iTi Solar 56 Gallium Nitride GaN 56 microfocus X ray 56 stylus profilers 56 Laser VCSEL 56 Grätzel cells 56 scatterometry 56 SiON 56 DPSS lasers 56 GaN HEMTs 56 #.# micron CMOS 56 millisecond anneal 56 extruded profiles 56 Complementary Metal Oxide Semiconductor 56 ultrafast laser 56 MEMS resonator 56 Silicon nanowires 56 semiconductor metrology 56 photodiode arrays 56 #.#μm [002] 56 SiGe bipolar 56 QMEMS 55 nanoantenna 55 FD OCT 55 #nm/#nm 55 gallium nitride GaN 55 EyeQ2 55 workcell 55 Altera FPGAs 55 proto typing 55 #nm CMOS [002] 55 opto electrical 55 Sequans SQN# 55 .# micron 55 CMOS logic 55 TestKompress 55 productive nanosystems 55 wafer metrology 55 CMOS imager 55 DEV DA TOMAR NEXT 55 MAX# integrates 55 #nm node [001] 55 Cadence Encounter digital 55 CMOS scaling 55 3D TSV 55 MPSoC 55 nanowire transistors 55 Achronix Semiconductor 55 DongbuAnam 55 shortwave infrared SWIR 55 neural prosthetic 55 CIGS solar 55 #nm NAND flash 55 Santur Corporation 55 VUV 55 ZMD AG 55 Strained silicon 55 Terahertz 55 laser sintering 55 Imprio 55 brightfield 55 Electrochemical Fatigue Sensor 55 uniaxial strain 55 photomask 55 #nm lithography [001] 55 Lightspeed Logic 55 TrueFocus 55 RTT DeltaGen 55 mmWave 55 MEMS inertial sensors 55 Synopsys TCAD 55 micromachining 55 Double Patterning 55 bioelectronic 55 SEMATECH 55 mask aligner 55 ECPR 55 ion traps 55 Scalado CAPS 55 Resistive Random Access 55 dimensional nanostructures 55 #nm geometries 55 wafer dicing 55 Carbon nanotube 55 nano coatings 55 FPGA architectures 55 laser scribing 55 indium gallium arsenide 55 spintronic devices 55 MEMS micro electromechanical 55 irreversible electroporation IRE 55 Plasmonic 55 chip SoCs 55 nm SRAM 55 TCAD tools 55 Xenics 55 CyberDisplay #K 55 Aki Fujimura 55 optical interconnections 55 carbon nanotubes CNT 55 electromagnetic simulation 55 semiconductor fabs 55 produced plasma LPP 55 microshutters 55 ReRAM 55 planar transistors 55 JENOPTIK GmbH 55 micromechanics 55 Magma Talus 55 ANTARES 55 QorIQ processors 55 spintronic 55 photocatalysts 55 x ray fluorescence 55 SAW resonator 55 Brion Technologies 55 productization 55 Crolles2 55 spectroscopic methods 55 mobileFPGA devices 55 #nm nanometer 55 Dip Pen Nanolithography ® 55 QPACE 55 photonic circuits 55 Serial Analyzer 55 monolithic CMOS 55 FinFET 55 silicon foundries 55 AFMs 55 Novelis Fusion TM 55 #/#nm 55 semiconducting nanowires 55 ferroelectric random access 55 planar waveguide 55 DfM 55 vertical cavity 55 x ray pulses 55 microdevice 55 Diode OLED 55 Calibre LFD 55 nanoengineered 55 UV LED 55 quantum cascade 55 computational simulations 55 UV2A 55 IGBT Insulated Gate 55 MEMS resonators 55 through silicon vias 55 Bipolar CMOS DMOS 55 Micro Epsilon 54 PaxScan 54 tunable filters 54 optical interconnect 54 MALDI-TOF/TOF 54 #.# micron node 54 broadly tunable 54 coater developer 54 Crolles2 Alliance 54 additive fabrication 54 SuperArray 54 Docea 54 fxP 54 microspectroscopy 54 tunable filter 54 FinFETs 54 biodetection 54 dimensional metrology 54 X ray absorption spectroscopy 54 Cortex M3 core 54 GaN transistors 54 X ray detector 54 linear collider 54 millimeter wafer 54 piezoelectric transducer 54 optical biosensor 54 dye sensitized 54 Molecular Imprints 54 cryogenically cooled 54 photonic integrated circuits 54 Structured ASICs 54 photomasks 54 terahertz waves 54 picosecond laser 54 scanning tunneling microscopes 54 mask optimization SMO 54 photonic crystal 54 backside illumination BSI 54 quantum metrology 54 picosecond lasers 54 Immersion Lithography 54 CMOS silicon 54 optical isolators 54 QLED 54 circuit MMIC 54 FloEFD 54 MEMS sensor 54 Nanochip 54 Silicon Photonics 54 protein microarrays 54 photovoltaic PV module 54 electro optic polymer 54 Maskless 54 millisecond annealing 54 ALLVIA 54 Michal Lipson 54 Silicon Compiler 54 finFETs 54 TWINSCAN XT #i 54 MEMS gyroscope 54 nano electromechanical systems 54 #.#um CMOS 54 electron beam welding 54 CamSemi 54 Mixed Signal IC 54 DDR PHY 54 transistor HEMT 54 Fourier transform infrared 54 miniaturising 54 microfabrication techniques 54 ownership CoO 54 Crolles France 54 photodetectors 54 STMs 54 flexible OLED displays 54 LCOS 54 EBPG# 54 CAN transceivers 54 microelectromechanical system 54 tunable RF 54 correction OPC 54 EUV Lithography 54 SiGen 54 QuickCap NX 54 BiCMOS 54 immersion litho 54 InSb 54 MEMS MOEMS 54 DSP algorithm 54 amorphous TFT LCD 54 Microfabrica 54 atomic spectroscopy 54 Micromorph 54 interferometry 54 amorphous silicon Si 54 Xilinx FPGA 54 ExoMars rover 54 Lasertec 54 C4NP 54 active matrix OLEDs 54 Powerful debug 54 Oled 54 CPU emulation 54 moviNAND memory 54 microbolometers 54 optoelectronic packaging 54 transistor arrays 54 amorphous silicon TFT 54 biophotonic 54 nano fabrication 54 Ultra wideband 54 Xaar printheads 54 GaAs MMIC 54 MEMS oscillator 54 laser triangulation 54 epitaxy HVPE 54 EUVA 54 Nemerix 54 reactive ion 54 PLED 54 TSMC #nm process 54 micromechanical devices 54 Vindicator LWS 54 low k dielectrics 54 embedded nonvolatile memory 54 electroluminescence 54 microstructured 54 Vistec Lithography 54 etch deposition 54 XFP module 54 LiNbO3 54 JEOL 54 silicon photovoltaics 54 package SiP 54 nanotube transistor 54 Photonic Integrated Circuits 54 #nm laser [002] 54 FotoNation FaceTracker 54 OPTIMASS 54 Angstron 54 CoolPAM 54 Epson Toyocom 54 photonic components 54 nonpolar GaN 54 FUSI 54 metallic interconnects 54 nano cellulose 54 Vistec 54 fused quartz 54 MAPPER Lithography 54 Selective Laser Sintering SLS 54 Synopsys DesignWare IP 54 EUV resist 54 silicon interposer 54 microelectronic devices 54 microelectronic packaging 54 CIGS Copper Indium 54 transmission electron microscopes 54 #.#μm CMOS process 54 PAM RTM 54 FPGA prototyping 54 cytometry 54 Stemmer Imaging 54 rapid prototyping RP 54 Silicon Carbide SiC 54 magnetron sputtering 54 CMOS 54 Indium Phosphide 54 OEM ODMs 54 multiphoton microscopy 54 nm SoC 54 HiPER 53 FlexUPD 53 SystemC synthesis 53 NXT robotics 53 piezo ceramic 53 linear encoder 53 El Mul 53 laser optics 53 nanometer transistors 53 HRTEM 53 MB#K# 53 SMIC #.#um 53 SEMATECH 3D 53 Copper Indium Gallium Selenide 53 hyperMILL ® 53 X Ray Diffraction 53 Fraunhofer IPMS 53 OLEDS 53 inertial sensor 53 scanning microscopy 53 indium tin oxide ITO 53 AMS RF 53 Silicon photonics 53 F3D 53 Foveon X3 53 lensless 53 RSoft 53 Mbit MRAM 53 MIRAI 53 phototransistors 53 TMOS display 53 nanocomposite materials 53 Adimos 53 MOS transistor 53 x ray spectroscopy 53 Organic Light Emitting 53 Scanning Probe Microscopes 53 BEOL 53 Nexense 53 iDP 53 MTS# 53 lithographic techniques 53 indium gallium nitride InGaN 53 microchannel plate 53 nanoscale patterning 53 nanometer nm NAND flash 53 exascale computing 53 scanning electron microscopes 53 superlens 53 ICs lasers 53 MEMs 53 GaN HEMT 53 DCG Systems 53 sensor arrays 53 optical microscopy 53 SchmartBoard ez 53 piezoelectric actuator 53 interposers 53 Raman spectrometers 53 Circulating Tumor Cell 53 Affinity Biosensors 53 UMC #nm 53 industrial inkjet printing 53 OptimalTest 53 photonic crystal fibers 53 neuromorphic 53 SignalExpress 53 UV lasers 53 LADAR 53 crystalline Si 53 nanofactory 53 STM#L 53 ESL synthesis 53 photon counting 53 sampling oscilloscopes 53 Auria Solar 53 serial backplane 53 electromagnetic flowmeter 53 Stratix II FPGAs 53 SpecMetrix 53 chalcogenide 53 #nm RF CMOS 53 logic NVM 53 scanning electron microscope SEM 53 inorganic nanocrystals 53 femtosecond lasers 53 functional prototypes 53 nanoscale fabrication 53 ChemetriQ 53 molecular spectroscopy 53 PenTile 53 cryo electron microscope 53 hydride vapor phase 53 Bandwidth Semiconductor 53 Fraunhofer IZM 53 lightwave 53 WS CRDS 53 Evaluation Module 53 ultrashort pulse laser 53 Flex OneNAND 53 Inovys 53 photon detection 53 Apogee Photonics 53 ActiPix 53 wafer thinning 53 deep ultraviolet DUV 53 Physware 53 airborne lidar 53 HPLC-Chip/MS 53 rollable displays 53 nanofabricated 53 SiGe C 53 Transmeta Efficeon processor 53 #nm MirrorBit 53 bipolar CMOS DMOS 53 microlasers 53 CMOS MEMS 53 innovative Buried Wordline 53 darkfield 53 multilayer ceramic capacitors 53 ModLyng 53 LTQ Orbitrap XL 53 Acreo 53 nanomanufacturing 53 Opti Probe 53 Silicon Dimensions 53 nanomechanics 53 TAIYO YUDEN 53 IQ Aligner 53 QCLs 53 PicoP display technology 53 DLP Pico ™ 53 MESFET 53 Wafer Bonding 53 GER SMH 53 hyperlens 53 Moritex 53 semiconductor nanowire 53 ZigBee compliant 53 nanofluidic devices 53 CdTe solar 53 biochips 53 BAW filters 53 PeakView 53 Penabled 53 Holographic Versatile Disc HVD 53 GHz chipsets 53 OrganicID 53 electro optical polymer 53 powerline modem 53 CMOS Photonics 53 Silicon Germanium SiGe 53 eFlash 53 ultrafast fiber 53 embedded DRAM eDRAM 53 CEA Leti 53 organic electroluminescent 53 X2 TECHNOLOGY 53 metallic nanostructures 53 manufacturable 53 BCDMOS 53 miniaturized sensors 53 DEK Solar 53 Silicon Hive 53 GiDEL 53 QorIQ platforms 53 nanostructured silicon 53 interferometric 53 #nm HKMG 53 Dassault Systemes CATIA 53 silicon MEMS 53 conductive inks 53 electrodeposition 53 Attana 53 AMCC QT# 53 LDMOS RF power 53 functionalizing 53 photodiode array 53 Helios NanoLab 53 manufactures integrated circuits 53 Braggone 53 wafer lithography 53 CY#C#x# 53 retinal prosthesis 53 clockless 53 inertial MEMS 53 Avalue Technology 53 Nissha 53 NXP SmartMX 53 2G HTS wire 53 nanolaser 53 EVG# 53 semiconductor 53 Buried Wordline technology 53 autostereoscopic 53 MMICs 53 antimonide 53 Heidelberg Instruments 53 consortium Sematech 53 GaN LEDs 53 integrated passives 53 D1X 53 VeloceRF 53 photonic integration 53 Ion Trap 53 SystemC simulation 53 Productive Nanosystems 53 Liteye Systems 53 CIGS PV 53 foil resistor 53 manganite 53 ProFire Excel 53 microelectronic circuits 53 inkjet printing systems 53 SolarWindow 53 Stratasys FDM 53 SynTest 53 optical spectroscopy 53 RF Microwave 53 AlN substrates 53 laser interferometer 53 collinear 53 RF MEMS switches 53 optical cloaking 53 vibrational spectroscopy 53 Kubotek Validation Tool 53 Metrology System 53 ARM#EJ processor 53 FineSim Pro 53 microplate instrumentation 53 UWB chipsets 53 Altera Stratix III 53 mask reconfigurable 53 magnetoresistive random access 53 tunable optical 53 AFM SPM 53 ArchPro 53 opto 53 sputter deposition 53 1Gbit DDR2 52 nonlinear optical 52 imaging EBI 52 terahertz spectroscopy 52 LTPS LCD 52 voltage CMOS 52 diode OLED display 52 collimators 52 photochromics 52 roadmapping 52 CapSense ® 52 International SEMATECH Manufacturing 52 silicon photovoltaic PV 52 metallisation 52 lenticular lenses 52 micromorph 52 patterning technique 52 virtual prototyping 52 X ray detectors 52 Freescale UWB 52 HORIBA Jobin Yvon 52 nanometer node 52 Helioseismic 52 synchronous buck converter 52 Agilent DisplayPort 52 WiCkeD 52 GaN transistor 52 MoSys 1T SRAM 52 Calibre PERC 52 parametrics 52 Tezzaron 52 #nm SRAM 52 Beamline #.#.# 52 Surface Acoustic Wave 52 fluorescence excitation 52 #.#μ 52 multijunction solar cells 52 ARC configurable processor 52 Photomask 52 Avancis 52 Intel #P chipset [001] 52 nanochannel 52 FLCOS 52 Microfluidic 52 gamma ray detector 52 RF CMOS 52 Phoseon Technology 52 chip optical interconnects 52 CMOS complementary 52 density interconnect HDI 52 nanometer 52 High Voltage CMOS 52 Miyachi Unitek 52 Configurable Logic 52 wideband RF 52 Encounter RTL Compiler 52 nonvolatile memories 52 nanopore sequencing 52 FD SOI 52 JESD#A 52 nm node 52 Texas Instruments DaVinci 52 GaAs PHEMT 52 nanomanipulation 52 UniPhier 52 Imec 52 nanometer CMOS 52 SilTerra 52 Nanometer 52 photoluminescence 52 SMaL Camera 52 ultrahigh density 52 Mask Aligner 52 lithographic patterning 52 CMP consumables 52 GAIN HBT 52 Absorption Spectroscopy 52 HBLED 52 imaging spectroscopy 52 Georges Charpak France 52 nanofluidics 52 electrophoretic display 52 copper interconnects 52 PV module manufacturing 52 PSoC architecture 52 multichip 52 DS DBR 52 Tessera Licenses 52 magnetostrictive 52 eZ# RF# 52 #Gbps transceivers 52 TDK EPC 52 transistor circuits 52 OPTEK 52 Sanyo Epson 52 subwavelength 52 Biochip 52 terrestrial concentrator 52 NPFLEX 52 5V CMOS 52 GaAs MMICs 52 Indium Phosphide InP 52 Xpedion 52 ultrahigh resolution 52 active matrix OLED 52 #nm wavelength [001] 52 E ELT 52 thermal inkjet 52 Exascale computing 52 nanostructuring 52 SD OCT 52 photoresist 52 gigabit Gb NAND flash 52 PCI Express PHY 52 #.#u 52 SIMD instruction 52 transparent electrode 52 baseband chipset 52 DirectFET 52 FIB SEM 52 PHEMT 52 ARChitect 52 linearly polarized 52 athermal 52 Quartz DRC 52 Gaussian beam 52 photomultipliers 52 Cortex M0 processor 52 Analog FastSPICE ™ 52 SensorDynamics 52 PhlatLight 52 argon fluoride 52 THz imaging 52 silicon nanophotonic 52 jitter wander 52 TrueScale 52 silicon waveguide 52 multiplexed assay 52 Soitec Concentrix 52 photopolymer 52 Negevtech 52 ITER fusion 52 SiC wafers 52 CIGS solar cells 52 Photonic crystals 52 FDSOI 52 PEALD 52 LTPS 52 sapphire substrate 52 Altatech 52 avalanche photodetector 52 capacitive touch sensing 52 PolyJet 52 wafer bonding 52 microprocessing 52 silicon photomultiplier 52 #nm lithography [002] 52 photopolymers 52 micro fluidics 52 wide bandgap 52 Electron beam 52 MEMS 52 ChIP chip 52 Gallium Arsenide GaAs 52 lasers optics 52 MultiWave 52 TCAD Sentaurus 52 ExpEther 52 submicron CMOS 52 sub #nm CMOS 52 SOPC Builder 52 INTRINSIC 52 Bipolar CMOS DMOS BCD 52 Keithley RF 52 #.#μm CMOS 52 XDR DRAM 52 optofluidic 52 RFIC simulation 52 bioinstrumentation 52 laser diode modules 52 Solido Variation Designer 52 evaluation module EVM 52 InGaAs 52 TOF mass spectrometer 52 LabVIEW FPGA Module 52 nm MirrorBit 52 Microdisplay 52 ARM7TDMI processor 52 HfSiON 52 biothermal 52 multicore architecture 52 ASML TWINSCAN 52 nanosilicon 52 SiMoA 52 detector arrays 52 CMOx TM 52 THz radiation 52 Sofradir EC 52 reflectometry 52 precision metrology 52 millimeter wave mmWave 52 spectroradiometers 52 ScenSor 52 planar lightwave circuits 52 Mercury5e 52 Aptina Imaging 52 antireflection 52 OptoCooler 52 VHESC 52 Scanning Laser 52 nonvolatile RAM