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(Click for frequent words.) 68 wafer bonder 66 plasma etching 64 photoresist strip 64 mechanical polishing CMP 64 CRIUS 64 patented etch 63 Sigma fxP 63 LPCVD 63 photoresists 62 mask aligner 62 mask aligners 62 layer deposition ALD 62 CRIUS II 62 ion implant 62 AIXTRON AG 62 reactive ion 62 epi wafers 62 AIX #G# 61 dielectric etch 61 magnetron sputtering 61 UVTP 61 Control LACC 61 CIGS copper indium 61 Helios XP 61 amorphous silicon Si 61 ArF 61 hydride vapor phase 61 ion implantation 61 PECVD 61 chemical mechanical planarization 61 Novellus SABRE 61 VECTOR Express 61 CIGS solar 61 engineered substrates 60 CIGS thin film 60 DRIE 60 laser scribing 60 Aerosol Jet 60 aluminum nitride 60 crystalline silicon photovoltaic 60 DSS furnaces 60 CIGS photovoltaic 60 Alchimer 60 Chemical Vapor Deposition CVD 60 AquiVia 60 epitaxy HVPE 60 PEALD 60 carbon nanotubes CNT 60 Esatto Technology 60 NASDAQ AIXG 60 deep silicon etch 59 Stanyl ® 59 CIGS solar cells 59 physical vapor deposition 59 Gallium Arsenide GaAs 59 Aixtron MOCVD 59 NEXX Systems 59 transparent conductive 59 millisecond anneal 59 VIISta 59 inkjet printing systems 59 LiNbO3 59 ArF immersion 59 DualBeam 59 Photolithography 59 di selenide CIGS 59 photoresist stripping 59 nanometric films 59 deep ultraviolet DUV 59 CMP slurries 59 Chemical Vapor Deposition 59 gallium selenide 59 optical metrology 59 encapsulants 59 etching DRIE 59 Aixtron AG 59 Atomic Layer Deposition 59 metallization pastes 58 Selective Laser Sintering SLS 58 electrodeposition 58 HydroFix 58 microlithography 58 Nasdaq NVLS 58 CIGS photovoltaic PV 58 PolyJet Matrix TM 58 insulator wafers 58 wafer metrology 58 SOI silicon 58 CIGS Copper Indium 58 fxP 58 SOI wafer 58 micro optics 58 conformal coating 58 polishing pads 58 AlGaAs 58 micromachining 58 epitaxial wafers 58 monolithically integrated 58 photolithography 58 wafer bonding 58 silicon Si 58 Silicon Nitride 58 copper indium gallium diselenide 58 Applied Baccini 58 encapsulant 58 Gallium Arsenide 58 Soitec produces 58 SOI CMOS 58 zinc selenide 58 BEOL 58 #nm CMOS [002] 58 Opti Probe 58 CIGS solar cell 58 Gallium Nitride GaN 58 SOI wafers 58 Inc. NASDAQ MTSN 58 epiwafers 58 ion implanters 58 gallium arsenide indium phosphide 57 CMOS fabrication 57 germanium substrates 57 Si substrates 57 Deep Reactive Ion Etch 57 epitaxial deposition 57 thermosetting resins 57 Silicon Germanium 57 Planetary Reactor 57 brightness light emitting 57 Organic Chemical Vapor 57 solder reflow 57 overlay metrology 57 Transparent Conductive Oxide TCO 57 ion milling 57 copper metallization 57 MOCVD 57 industrial inkjet printing 57 carbon nanotube CNT 57 imprint lithography 57 Cadmium Telluride 57 planarization 57 microelectronic components 57 pHEMT 57 MOCVD reactors 57 photomasks 57 cadmium telluride CdTe 57 nanopowder 57 Polycrystalline 57 micro machining 57 polymer substrates 57 Electrografting 57 computational lithography 57 Richard Brilla CNSE 57 optical coatings 57 metallisation 57 nanopowders 57 Powerful debug 57 Epitaxial 57 CMOS wafer 57 hermetic packaging 57 liquid chromatographs 57 IGBT Insulated Gate 57 projected capacitive touch 57 high voltage BCDMOS 57 CMP slurry 57 nanotechnology MEMS 57 etch deposition 57 insulator substrate 57 nanoimprint lithography NIL 57 nanofilm 57 Follow Vishay 56 Silicon wafer 56 GaAs InP 56 ownership CoO 56 backside illumination BSI 56 CVD diamond 56 flexible monolithically integrated 56 wafer thinning 56 nitride semiconductor 56 Immersion Lithography 56 Nova NanoSEM 56 DPN ® 56 furnaceware 56 electroless copper 56 ENLIGHT TM 56 CMP consumables 56 EDXRF 56 CdTe PV 56 copper indium gallium 56 GaAs substrates 56 Nasdaq DSTI developer 56 Chemical Mechanical Planarization 56 silicide 56 millisecond annealing 56 gallium nitride GaN 56 CdTe Si 56 Copper Indium Gallium 56 Fraunhofer IKTS 56 indium gallium phosphide InGaP 56 nanoporous 56 Nasdaq VECO 56 Gallium Nitride 56 UHMW PE 56 electron beam welding 56 silane gas 56 semiconductor metrology 56 Sensilica 56 UV curing 56 Tetratex 56 photovoltaic PV module 56 ZnS 56 silicon etching 56 OTCBB QPCI 56 Ultem 56 elastomeric seals 56 stereolithography SLA 56 cordierite 56 MOCVD systems 56 advanced leadframe 56 electro optic polymer 56 ceramic coatings 56 Silicon Carbide SiC 56 microfabrication 56 silicon PV modules 56 BiFET 56 SOI substrates 56 DiCon 56 nanoparticle characterization 56 ion implantation equipment 56 CIGS solar panels 56 transparent conductive electrodes 56 #nm silicon 56 reed switches 56 crystalline silicon c 56 nano optic 56 photoresist 56 DSS#HP 56 nano coating 56 nano patterning 56 film transistor TFT 56 sapphire substrate 56 Dektak 56 DSi etch 56 #.#um CMOS 56 laser diode modules 56 EVG# 56 Indium Phosphide InP 56 conformal coatings 56 AQUANOX A# 56 AlN 56 bismuth telluride 56 wire bonders 56 Aixtron SE 56 SUSS 56 Inc. 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Nasdaq MTSN 54 transmission electron microscopes 54 Inc. 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NASDAQ AXTI 54 Oxide Silicon 54 SiC substrates 54 C0G 54 silicon photovoltaic PV 54 GaAs pHEMT 54 VUV 54 wave SAW 54 organic TFTs 54 silicon MEMS 54 bicomponent 54 HBLED 54 Vor ink 54 aluminum nitride AlN 54 structural adhesives 54 ArF dry 54 abrasive waterjet 54 epitaxial 54 circuit MMIC 54 GaN substrates 54 PROLITH 54 NOxOUT 54 tantalum capacitor 54 semiconductor lithography 54 Inc. 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NASDAQ RTEC 53 GaN wafer 53 silicon nitride 53 Tessera Licenses 53 millimeter wave integrated circuits 53 micromachined 53 piezoelectric ceramic 53 Therma Wave 53 AFM probes 53 SMT placement 53 OptiChem 53 Optical Profiler 53 decorative laminates 53 photovoltaic wafers 53 AlSiC 53 functionalizing 53 calcium fluoride 53 IBIDEN 53 molecular spectroscopy 53 multicrystalline solar cells 53 Ultipleat 53 .# micron 53 Valox 53 Automated Optical 53 ellipsometry 53 bipolar transistors 53 Velocity# 53 SnO2 53 HVPE 53 brightfield 53 GER SMH leading 53 Heidelberg Instruments 53 piezo actuators 53 UV Visible 53 Imprio 53 precision microsurgery instrumentation 53 electro optical polymer 52 multilayer ceramic capacitors MLCC 52 opto electronic components 52 LENS powder 52 High Productivity Combinatorial 52 nanometal 52 solar PV module 52 NanoBridge 52 boron nitride 52 regenerable 52 exotic alloys 52 SiC 52 Silterra Malaysia Sdn 52 titanium nitride 52 CMOS silicon 52 x ray spectroscopy 52 catalytic oxidation 52 composite laminates 52 diodes HB LEDs 52 ion chromatography 52 CdTe 52 microelectronic devices 52 focused ion beam 52 hydrogen purifiers 52 high-k/metal gate 52 UMG Si 52 Cree GaN 52 multicrystalline wafer 52 AIXTRON MOCVD 52 Thin Film Line 52 NASDAQ ACLS 52 silicon nanoparticles 52 magnetostrictive linear position 52 #G CFP 52 rigid foams 52 precision metrology 52 Nanofiltration 52 Solamet ® 52 SiGe C 52 nanostructured silicon 52 ultrafiltration membrane 52 corrosive abrasive 52 particle sizing 52 standalone metrology 52 mono crystalline 52 nanocomposite materials 52 epiwafer 52 Pranalytica 52 precision quartz 52 polyethylene fiber 52 thermoplastic biocomposite compounds 52 microelectromechanical 52 thermoelectric coolers 52 microfabrication techniques 52 Optomec 52 quickturn 52 indium gallium phosphide 52 ultrafiltration membranes 52 HB LED 52 Suss MicroTec 52 Inovys 52 Schottky Diodes 52 WaferPro 52 electron optics 52 Laurent Malier CEO 52 #nm wavelength [001] 52 DS DBR 52 monochromators 52 monocrystalline wafers 52 multicrystalline silicon cells 52 wafer processing 52 die bonders 52 varactors 52 Polyimide 52 Lambda Physik 52 String Ribbon 52 liquid chromatograph 52 metalcutting 52 multicrystalline wafers 52 aluminum electrolytic capacitors 52 C4NP 52 micro optic 52 HgCdTe 52 SiC wafers 52 Apogee Photonics 52 Surface Mounted 52 HamaTech APE 52 CO2 lasers 52 excimer lasers 52 laser peening 52 mount SMT 52 nanoimprint 52 weldability 52 Photomask 52 Solibro 52 ceramic proppants 52 rigid polyurethane foam 52 ionomer 52 GaAs substrate 52 mount inductors 52 metal matrix composites 52 excimer 52 cabinet refacing products 52 low k dielectric 52 DCG Systems 52 CMOS RF CMOS 52 argon fluoride ArF 52 NOxOUT SCR ® 52 macroporous 52 NASDAQ LTXX 52 boron carbide 52 TSV metallization 52 chemically resistant 52 InGaN 52 flex circuits 52 gate dielectrics 52 electro deposition 52 nanocoatings 52 bonder 52 Veeco 52 Quantum Leap Packaging 52 Silicon CMOS Photonics 52 Fluidigm Corporation 52 perfluoroelastomer 52 EUV masks 52 cadmium telluride semiconductor 52 introduction NPI 52 thermoplastic compounds 52 TMOS display 52 RFMD GaN 52 Lasertec 52 debug characterization 52 photonic integrated circuit 52 HV CMOS 52 GenVault Corporation 52 multicrystalline 52 displays FPD 52 millimeter wave mmWave 52 low k dielectrics 52 nanocoating 52 underfill 52 InnerArmor 52 5μm 52 Indium Phosphide 52 CMOS wafers 52 CIGS cells 52 Micrel Semiconductor 52 Applied Endura 52 Gildas Sorin CEO 52 polyaspartic 52 diode pumped 52 nucleic acid purification 52 DPSS lasers 52 CIMPortal 52 silicon micromachining 52 Ansoft Designer 52 Spinlace 52 nano coatings 52 CMOS transistors 52 millimeter silicon wafers 52 Microsemi Nasdaq MSCC 52 FWB SMH GER SMH 52 ceramic capacitor 52 MEMS resonators 52 wafer foundries 52 particle characterization 52 cored wire 52 ultrafast laser 52 #mm silicon wafers 52 sintered metal 52 Inc. Nasdaq ESIO 52 prepolymers 52 SIMOX 52 Trikon Technologies 52 submicron 52 multicrystalline silicon wafers 52 Nexxim 52 Solid Oxide Fuel Cell 52 NiSi 52 Chipmaking equipment 52 MEMS fabrication 52 brazing alloys 52 Alanod Solar 52 silicon oscillators 52 Kotura 52 Picogiga delivers advanced 52 MALDI 52 nm lithography 52 liquid crystal polymer 52 HEMT 52 programmable logic devices PLDs 52 Maxtek 52 mask ROM 52 2G HTS wire 52 Double Patterning 52 ADXL# 52 ultrapure 52 ceramic crucibles 52 nanostructured materials 52 performance solar encapsulants 52 ViPR 52 electron emitter 52 Wafer Bonding 52 finely dispersed 52 thermoplastic TPV 52 Electro Chemical 52 silicon wafer 52 3D Interconnect 52 Tokyo Electron Limited 52 AMLCD 52 cermet 52 nano fabrication 52 potassium niobate 52 Skydrol ® aviation 52 additive fabrication 52 MAX# integrates 52 Ge substrates 52 leadframe 52 nanocomposite material 52 microbolometer 52 Perkinamine 52 Agilent DisplayPort 52 dielectric insulation 52 amorphous silicon PV 52 oxide layer 52 Filmetrics 52 micromorph 52 Nitto Denko Corporation 52 MaxBright 52 nm FPGA 52 NANOIDENT 52 aligned carbon nanotubes 52 concentrated photovoltaic CPV 52 embedded NVM 52 fumed silica 52 HBTs 52 Silicon Oxide Nitride 52 wirewound 52 Kuan Yin Taiwan 52 wafer bumping 52 chromatographic separations 52 quantum dots QDs 52 silicon oxynitride 52 Gyrolab 52 phosphorescent OLED technology 52 k dielectric 52 solventless 52 anneal 52 optical modulators 52 ASML immersion 52 silicon carbide 51 Varistors 51 sapphire substrates 51 #nm DRAM 51 defect densities 51 AFMs 51 GaN 51 Inc. Nasdaq EGLS 51 UMCi 51 Xenemetrix 51 Parylene 51 microengineering applications 51 Applied Materials SunFab 51 Nasdaq TGAL 51 nMOS 51 nickel silicide 51 Nanomanufacturing Technology