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(Click for frequent words.) 70 submicron 62 etching DRIE 61 reactive ion 61 photolithographic 61 #.#um [001] 61 accuracy repeatability 61 #μm [002] 61 subwavelength 61 #μm [001] 60 nanometric 60 planarization 60 5μm 60 #um [002] 60 imprint lithography 60 sub Angstrom 59 μm 59 subnanometer 59 epi wafers 59 dielectric etch 59 HPLC columns 59 transistor arrays 59 1μm 59 #.#μm [001] 59 CMOS transistors 59 micron 58 Ascentis Express 58 planarity 58 wafer thickness 58 Nova NanoSEM 58 silicide 58 x ray optics 58 MEMS resonators 58 photonic bandgap 58 2μm 58 wafer uniformity 58 deep submicron 58 ownership CoO 58 e beam lithography 58 CMOS compatible 58 edge roughness LER 57 particle sizing 57 solder bump 57 SiC substrates 57 micromachined 57 photolithography 57 finely dispersed 57 copper interconnects 57 low k dielectrics 57 SiGe bipolar 57 microfabrication 57 2Xnm 57 wafer dicing 57 CMOS fabrication 57 submicrometer 57 aspheric 57 BEOL 57 defect densities 57 LiNbO3 57 microstructures 57 defectivity 57 parasitic capacitance 57 micrometer 57 gate dielectrics 56 parasitic inductance 56 linewidths 56 computational lithography 56 #.#nm [002] 56 metallisation 56 deep sub micron 56 silicon etch 56 HEMTs 56 through silicon vias 56 silicon etching 56 wafer metrology 56 PIN photodiodes 56 dielectrics 56 nanoindentation 56 thermo mechanical 56 singulation 56 #.#μ 56 etch deposition 56 electron optics 56 #nm nodes 56 micromachining 56 ink droplet 56 warpage 56 WLCSP 56 coating thickness 56 nanochannels 56 NiSi 56 DEV DA TOMAR NEXT 56 lattice mismatch 56 nano patterning 56 3Xnm 56 crystal resonator 56 particle sizes 56 GaN wafers 56 copper metallization 56 overlay metrology 56 monodisperse 55 focused ion beam 55 InGaAs 55 #.#um CMOS 55 dual damascene 55 metallization 55 electron scattering 55 DualBeam 55 nanometer scale 55 #.#μm [002] 55 microfocus X ray 55 AlN 55 microstructured 55 MOS transistors 55 ferrite core 55 numerical aperture NA 55 solder paste 55 solder bumps 55 silicon waveguides 55 nanoliter 55 analyte 55 micromechanical 55 micromirror 55 geometries 55 microcavities 55 nanocrystal 55 manufacturability 55 AlGaN 55 #um [001] 55 substrate 55 dielectric materials 55 photoresists 55 nanoimprinting 55 passivation 55 scanning electron microscope SEM 55 cemented carbide 55 AlGaAs 55 flux residues 55 wafer thinning 55 piezo actuators 55 wafer probing 55 tight tolerances 55 stripline 55 SOI CMOS 55 photodiode 55 dopant 55 repeatability 55 polishing pads 55 crystallinity 55 APTIV film 55 TSVs 55 laser micromachining 55 thermomechanical 55 micrometer scale 55 phototransistors 55 monochromator 55 wafer 55 integrated passives 55 rheometer 55 microvia 55 colorimetry 54 numerical aperture 54 threshold voltages 54 Si substrate 54 wirewound 54 microporous 54 voltage CMOS 54 brightfield 54 superabrasives 54 microdevice 54 deburring 54 Helios NanoLab 54 microcavity 54 mechanical polishing CMP 54 wirebond 54 #.# micron CMOS 54 beamsplitters 54 laser resonator 54 collimators 54 InAs 54 monolithically integrated 54 SAW oscillators 54 photoresist 54 vias 54 particle size 54 impedance measurements 54 InGaN 54 optical waveguides 54 nanoarrays 54 Photolithography 54 composite laminates 54 packaging WLP 54 sputter deposition 54 solder bumping 54 2nm 54 interposer 54 UVTP 54 geometries shrink 54 nanofilm 54 microlenses 54 CdSe 54 weldability 54 SOI wafers 54 conductivities 54 ferrite 54 interfacial layer 54 transmission electron microscopes 54 millisecond anneal 54 multiphoton microscopy 54 cordierite 54 QFNs 54 silica spheres 54 nonlinear optical 54 optical metrology 54 laser interferometer 54 conductive epoxy 54 stencil printing 54 sub picosecond 54 plasma etching 54 EUV masks 54 overmolding 54 microbolometers 54 sapphire substrate 54 #x# mm [003] 54 UHPLC 54 silicon MEMS 54 polymeric 54 microfluidic chips 54 epoxy matrix 54 reticle inspection 53 photodetectors 53 Stratix II FPGAs 53 microscopy techniques 53 Picogiga delivers advanced 53 nanoimprint 53 MWNT 53 nanopositioning 53 X ray diffraction microscopy 53 impurity atoms 53 epiwafers 53 microstrip 53 nonpolar GaN 53 μm thick 53 indium gallium arsenide InGaAs 53 copper electroplating 53 CMOS IC 53 hafnium oxide 53 microstructural 53 heterostructure 53 nm wavelengths 53 intermetallic 53 TiN 53 magnetostrictive 53 SWIR cameras 53 sub angstrom 53 EBDW 53 eutectic 53 manufactures integrated circuits 53 optical microscopy 53 nano imprint 53 interparticle 53 Perkinamine 53 micro machining 53 MAX# integrates 53 SOI substrates 53 nanotube arrays 53 electroluminescence EL 53 PVD coating 53 toroid 53 QFPs 53 stylus profilers 53 high voltage BCDMOS 53 SiC wafers 53 FWHM 53 diffraction 53 pellicle 53 mount SMT 53 epitaxial 53 YAG lasers 53 epitaxial layer 53 correction OPC 53 QMEMS 53 sintered 53 thermal gradients 53 MESFET 53 photopolymer 53 chromatographic separations 53 electromigration 53 CMOS ICs 53 X ray microscopy 53 sapphire wafers 53 rheological 53 mask aligner 53 fluorescence detection 53 CMOS logic 53 nano particle 53 electron beam welding 53 backside illumination 53 emitting lasers 53 crystallites 53 deep submicron CMOS 53 triplexer 53 electron mobility 53 aluminum nitride 53 nanometer 53 coplanarity 53 indium gallium phosphide InGaP 53 resistive element 53 shrinking geometries 53 gallium indium arsenide 53 DPSS lasers 53 nitride semiconductor 53 titanium carbide 53 chemical reactivity 53 mesoporous 53 wafer bonding 53 calcium fluoride 53 reagent consumption 53 silicon germanium SiGe 53 cm ² 53 nanofabricated 53 solder mask 53 nanometers billionths 53 k dielectric 53 Cesium Iodide scintillator 53 solderable 53 silicon photonic 53 silicon 53 silicon waveguide 53 ellipsometry 53 lithographic techniques 53 femtogram 53 ZnSe 53 mount inductors 53 SOI wafer 53 micrometer sized 53 furnaceware 53 GaAs gallium arsenide 53 bending radii 53 FE SEM 53 UNCD 53 Sensilica 53 GaN layers 53 SiMoA 52 sub micron particles 52 planar CMOS 52 microfabricated 52 lithography 52 nanoflow 52 III V epiwafers 52 vapor deposition 52 surface roughness 52 EUV lithography 52 optical lithography 52 z axis 52 parallel kinematics 52 Silicon Germanium 52 conformal 52 dimensional metrology 52 porous silicon 52 interposers 52 reaction kinetics 52 microfluidic channels 52 oxide layer 52 Orbitrap 52 BGA packages 52 LTPS TFT 52 #.#mm diameter [002] 52 optical encoder 52 silicon substrates 52 compressive stress 52 BGA packaging 52 embedded nonvolatile memory 52 metallic nanostructures 52 thermoset composites 52 Stratix III FPGAs 52 stereolithography 52 heterogeneous catalysts 52 micrometre 52 mask aligners 52 toric lens 52 Silicon Via TSV 52 precision metrology 52 dielectric constants 52 underfill 52 5V CMOS 52 metrology 52 nano scale 52 AFM probes 52 CyberDisplay #K 52 SiO2 52 opto electrical 52 MEMS resonator 52 impedance matching 52 photodetector 52 wavelength tunability 52 nanopowder 52 diffractive 52 PIN photodiode 52 darkfield 52 wafer bumping 52 1nm 52 inkjet printhead 52 millisecond annealing 52 flexographic plates 52 nm lithography 52 planar 52 micro optics 52 HRTEM 52 PHY# [001] 52 nm geometries 52 output capacitors 52 CMOS photonics 52 PEEK OPTIMA 52 singlemode 52 lithographic processes 52 micrometre scale 52 capacitances 52 Silicon CMOS Photonics 52 #.#mm [002] 52 Alien Crosstalk 52 MALDI 52 fused quartz 52 #nm lithography [001] 52 multilayers 52 aluminum gallium nitride 52 dielectric 52 nano imprint lithography 52 QFN packages 52 #nm #nm [002] 52 nanosized 52 nm nodes 52 hermetic packaging 52 coupling capacitors 52 Chip Scale 52 reticles 52 WL CSP 52 nanocages 52 nanocrystalline 52 MEMS oscillator 52 ultrashort pulses 52 optical coatings 52 nanoscale 52 flexo printing 52 reflectometry 52 ARPES 52 laser diode module 52 emitting laser VCSEL 52 linear encoder 52 nanometer node 52 optically transparent 52 ENIG 52 TiO 2 52 chipscale 52 CMOS scaling 52 dimensional nanostructures 52 NPFLEX LA 52 highly conformal 52 inkjet printer cutters 52 micron sized 52 ADXL# 52 optical aberrations 52 lp mm 52 nanometers nm 52 C0G 52 Silicon Nitride 52 package SiP 52 processability 52 aspherical lens 52 layer deposition ALD 52 PIN diode 52 manganite 52 #nm CMOS [002] 52 Mach Zehnder modulator 52 CMOS processes 52 autosampler 52 Ball Grid Array 52 machinable 52 #nm immersion 52 nanoscopic 52 zeolite membranes 52 Oxide Silicon 52 MSn 52 nanowire transistors 52 workpiece 52 tribological 52 SHELLCASE 52 epitaxial wafers 52 nanotubes nanowires 52 optical isolators 51 repeatable measurements 51 HV CMOS 51 SMT LEDs 51 scintillator 51 tunable filter 51 macroporous 51 swarf 51 Arria GX FPGAs 51 piezo actuator 51 graphene layers 51 smaller geometries 51 MOS transistor 51 particle dispersion 51 SiPs 51 Bragg grating 51 Indium Phosphide InP 51 tensile modulus 51 piezo ceramic 51 epitaxial structures 51 #.# micron node 51 μm diameter 51 nanolithography 51 ZnS 51 microscale 51 SiO 2 51 fluorescence spectroscopy 51 VECTOR Express 51 SiT# 51 ISL#M 51 nanomesh 51 nanofluidic devices 51 emulsion PCR 51 photoluminescence 51 femtosecond lasers 51 magnetic encoder 51 Carbon nanotube 51 #μm thick [002] 51 anneal 51 vertical cavity 51 ultrasonic transducers 51 absorbance 51 CVD diamond 51 nano structured 51 PBGA package 51 Microfluidic devices 51 ArF immersion lithography 51 #nm node [002] 51 SWCNTs 51 monolayer 51 microvias 51 dielectric constant 51 flexure 51 electrospray ionization 51 pMOS 51 superparamagnetic 51 plasma etch 51 GaAs HBT 51 SWCNT 51 thermal dissipation 51 #nm wavelength [001] 51 leakage currents 51 BiFET 51 EO polymer 51 nanodiamond 51 bond aligner 51 analog circuitry 51 angstroms 51 #.#x#.#mm 51 scanning electron microscopes 51 tunable optical 51 silicon substrate 51 scatterometry 51 semiconductor wafer 51 monolithic microwave integrated 51 photomultipliers 51 extruded profiles 51 nanopositioning stages 51 InN 51 PROLITH 51 FinFETs 51 workpieces 51 Vertical Cavity Surface Emitting 51 electromagnetic simulation 51 epitaxy HVPE 51 palladium Pd 51 backside metallization 51 nanostructuring 51 nitride 51 extruded sheet 51 LPCVD 51 EUV mask 51 laser speckle 51 PolyJet Matrix TM 51 pHEMT 51 laser triangulation 51 #.#in [004] 51 BiCMOS 51 waviness 51 thinner wafers 51 FEOL 51 QCLs 51 thermoplastic elastomer 51 femtosecond laser pulses 51 boron nitride 51 functionalized 51 capacitive touch sensor 51 indium arsenide 51 triaxial 51 deformable mirror 51 photon absorption 51 hardfacing 51 HEMT 51 parasitic extraction 51 Logic Navigator 51 picosecond 51 nanosize 51 K dielectrics 51 confocal laser scanning 51 elastic moduli 51 capacitance 51 stray capacitance 51 conformal coating 51 TSMC #.#um 51 #nm #nm [005] 51 ultrahigh resolution 51 SiON 51 nano coatings 51 MWNTs 51 gelation 51 SurePrint 51 Calibre LFD 51 SiliconSmart ACE 51 chip variation OCV 51 narrow linewidth 51 photonic devices 51 solvent evaporation 51 #x# mm [004] 51 extractables 51 CMP consumables 51 SPICE accuracy 51 MTS# 51 silicon nitride 51 Schottky barrier 51 photon counting 51 nano fluidic 51 HfO2 51 #nm laser [001] 51 hardcoat 51 femtosecond pulse 51 transmissivity 51 detector arrays 51 #nm DRAM 51 concentricity 51 .# micron 51 GaAs pHEMT 51 gate electrode 51 Silicon Oxide Nitride 51 solder pastes 51 anisotropic 51 voltage divider 51 CBT resin 51 microns 51 photoelectron spectroscopy 51 atomically smooth 51 InSb 51 outcoupling 51 CMOS MEMS 51 electroless nickel 51 IGBT Insulated Gate 51 rheology 51 carbides 51 x ray diffraction 51 epitaxial deposition 51 heterostructures 51 optical transceiver modules 51 photon detection 51 photomask 51 aspheres 51 cored wire 51 transparent electrode 50 rheometers 50 UV VIS 50 cuvette 50 OPTIMASS 50 SiGe C 50 nanoimprint lithography NIL 50 nm wavelength 50 VCSEL 50 ProFire Excel 50 #x#mm [002] 50 tunable filters 50 EDXRF 50 XFP module 50 etalon 50 pore sizes 50 substrates 50 dielectric layers 50 immersion lithography 50 nanoantenna 50 gallium nitride GaN 50 Stratix IV FPGA 50 #MS s [002] 50 ion implantation 50 absorption coefficient 50 doped silicon 50 areal densities 50 oxide semiconductor 50 6mm x 50 nanoparticle arrays 50 optical waveguide 50 ultraviolet lasers 50 solder reflow 50 carbon nanotube CNT 50 wafer probers 50 coercivity 50 fiber optic transceivers 50 supercritical fluid 50 sub micrometer 50 Encounter RTL Compiler 50 slurries 50 thermally activated 50 electron diffraction 50 ADA# 50 optomechanical 50 metallic interconnects 50 wide bandgap semiconductor 50 GaAs substrates 50 toner particles 50 leadless package 50 linearization 50 solder paste printing 50 inelastic scattering 50 lithography simulation 50 wafer bonder 50 athermal 50 polymer substrates 50 coplanar 50 nano powders 50 TOF TOF 50 spectral imaging 50 #μF [001] 50 nanopatterning 50 GaP 50 collimator 50 electroless 50 photonic crystal 50 QFN# package 50 hyperspectral imager 50 LabChip 50 RF amplifier 50 colloidal 50 thermal conduction 50 Stratix III 50 5nm 50 nanocrystals 50 Electron microscopes 50 x ray beam 50 Fractional N 50 chamfering 50 parasitics 50 leadframe 50 pipette tip 50 nano tubes 50 SOI substrate 50 DDR3 DIMMs 50 organic TFTs 50 CMOS silicon 50 density interconnect HDI 50 VCSELs 50 RFCMOS 50 optically pumped 50 Si substrates 50 maskless lithography 50 micro vias 50 micron particle 50 nanometer spatial 50 electrically insulating 50 printhead 50 chromatographic 50 lithographic 50 polymer fibers 50 optical biosensors 50 polymeric materials 50 scanning microscopy 50 laser diffraction 50 dispersive 50 electro optical polymer 50 EUV resists 50 displacement chromatography 50 SiliconDrive 50 bandgap 50 OP# [003] 50 frictional resistance 50 birefringence 50 FD SOI 50 microreactors 50 ion traps 50 nm VCSEL 50 nanomechanical 50 ArF 50 Victrex PEEK 50 silicon wafer 50 CMP slurries 50 exacting tolerances 50 zirconium oxide 50 4 x 4mm 50 intergranular 50 Exoscan 50 perovskite 50 manufacturability DFM 50 #.#μm CMOS 50 wire bondable 50 precise tolerances 50 CVD etch 50 SAW filter 50 Plasmonic 50 breakdown voltages 50 slitter rewinders 50 nanometers nanometer 50 inertial sensor 50 terahertz imaging 50 nonpolar 50 piezoelectric transducer 50 ceramic capacitor 50 CMOS imager 50 functionalization 50 nanometer lithography 50 AlSiC 50 Structured ASICs 50 magnesium fluoride 50 conformality 50 microfluidic 50 Fabry Perot 50 indium gallium 50 extendibility 50 VUV 50 reflow soldering 50 CCD detector 50 ITRS roadmap 50 flexural modulus 50 interconnected pores 50 Nanometer 50 pre preg 50 #nm node [001] 50 Dektak 50 ohmic 50 JENOPTIK GmbH 50 CMOS 50 tunable RF 50 DS DBR 50 MALDI imaging 50 FinFET 50 Ultra Wide Angle 50 #mm# [002] 50 SO8 50 comminution 50 nano crystals 50 overmolded 50 silicon nanowire 50 indium phosphide InP 50 quantum cascade 50 multichip 50 laser scanning confocal 50 UV curable ink 50 picosecond lasers 50 nanoporous 50 MI #XM 50 borosilicate 50 CoO 50 Selective Laser Sintering SLS 50 CMOS Image Sensor 50 magnetisation 50 Mixed Signal IC 50 Scanning Probe Microscopes 50 triple quadrupole 50 mosaicking 50 cavitation 50 Image Sensor 50 UV absorbance 50 densely spaced 50 weld seams 50 polystyrene spheres 50 electrodeposition 50 sSOI 50 bypass capacitors 50 MAX# MAX# [001] 50 frequency transducers 50 micron thick 50 backside illumination BSI 50 Star RCXT 50 Mbit SRAMs 50 3mm x 50 SAW resonator 50 microlens 50 #nm SoC 50 Vdd 50 MCP# AFE 50 Structured eASIC 50 epoxy composites 50 wavelength tunable 50 pn junctions 50 ARM#EJ processor 50 ohm cm 50 HBLEDs 50 delaminations 50 photomultiplier 50 Cu interconnects 50 aspheric lenses 50 microdevices 50 nanocubes 50 GaN LEDs 50 fused silica 50 #.#uF 50 Nd YAG 50 dimensional tolerances 50 reed switches 50 nanocrystalline diamond 50 spatial resolution 50 microgel 50 InGaP HBT 50 paramagnetic 50 UV inkjet printer 50 flowability 50 nanoelectromechanical systems 50 photonic crystal fibers 50 x 3mm 50 #mm# [001] 50 opto mechanical 50 nanometer CMOS 50 L2 L7 50 photobleaching 50 OCXO 50 BGA package 50 micro optic 49 EMIF# 49 Nd YAG laser 49 serial transceivers 49 #μ 49 tighter tolerances 49 GaAs substrate 49 UltraCMOS 49 polariton 49 micron pixel 49 OmniPixel3 HS 49 crosspoint switch 49 hermetic sealing 49 #nm laser [002] 49 electron bunches 49 electromechanical coupling 49 capillary tube 49 elastic modulus 49 Xilinx FPGA 49 CdTe Si 49 #m/min [002] 49 nm immersion 49 CMOS oscillators 49 diffractive optical elements 49 terahertz spectroscopy 49 LC MALDI 49 ion microscope 49 TestKompress 49 Young modulus 49 nm CMOS process 49 SerDes chipset 49 Simitri HD 49 chalcogenide 49 nanometers 49 optical amplifiers 49 FineSim Pro 49 Z axis 49 conductive adhesive 49 self assembled monolayer 49 Semiconducting 49 dephasing 49 GX FPGAs 49 picoliter 49 optical coherence tomography OCT 49 radial leaded 49 toroids 49 nanopowders 49 biomolecules 49 bypass capacitor 49 squeegee blades 49 microtubes 49 nm CMOS 49 dopants 49 HgCdTe 49 reflow profiles 49 polymer nanocomposite 49 aluminum oxide 49 adhesive bonding 49 macromolecules 49 using CMOS BiCMOS 49 polycrystalline 49 surface mountable 49 CIGS solar cells 49 parasitic capacitances 49 ultrahigh purity 49 indium gallium arsenide 49 PZT 49 2mm x 2mm 49 microcapillary 49 bismuth telluride 49 AlN substrates 49 PHEMT 49 ultraviolet curable 49 TGA# SL 49 aqueous cleaning 49 microbalance 49 photomasks